The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2021
Filed:
Jan. 30, 2015
Nexplanar Corporation, Hillsboro, OR (US);
Ping Huang, Beaverton, OR (US);
William C. Allison, Beaverton, OR (US);
Richard Frentzel, Murrieta, CA (US);
Paul Andre Lefevre, Portland, OR (US);
Robert Kerprich, Portland, OR (US);
Diane Scott, Portland, OR (US);
CMC Materials, Inc., Aurora, IL (US);
Abstract
Low density polishing pads and methods of fabricating low density polishing pads are described. In an example, a polishing pad for polishing a substrate includes a polishing body having a density approximately in the range of 0.4-0.55 g/cc. The polishing body includes a thermoset polyurethane material and a plurality of closed cell pores dispersed in the thermoset polyurethane material. Each of the plurality of closed cell pores has a shell composed of an acrylic co-polymer.