Richard Frentzel

Title: The Innovative Journey of Richard Frentzel

Introduction

Richard Frentzel, an accomplished inventor based in Murrieta, California, has made significant contributions to the field of polishing technology, particularly in the semiconductor industry. With a remarkable portfolio of nine patents, Frentzel continues to be at the forefront of innovation, developing advanced materials and methods that enhance the accuracy and efficiency of polishing processes.

Latest Patents

Two of Richard Frentzel’s latest patents showcase his expertise and ingenuity in developing specialized polishing pads. The first patent, concerning low-density polishing pads, describes a polishing body with a density ranging from 0.4 to 0.55 g/cc. This innovative polishing pad comprises a thermoset polyurethane material embedded with numerous closed cell pores, each featuring a shell made of an acrylic co-polymer. This design significantly improves the effectiveness of substrate polishing.

The second patent is focused on homogeneous polishing pads for eddy current end-point detection. This advancement highlights methods for fabricating polishing pads specifically engineered for polishing semiconductor substrates while utilizing eddy current end-point detection techniques. These inventions not only reflect Frentzel's creativity but also his commitment to pushing the boundaries of polishing technology.

Career Highlights

Throughout his career, Richard Frentzel has worked at prominent companies within the semiconductor industry, including Nexplanar Corporation and CMC Materials, Inc. His work at these organizations has allowed him to develop critical advancements that cater to the needs of modern semiconductor fabrication processes. Frentzel's expertise in polishing pad technology has positioned him as a key player in enhancing manufacturing efficiencies.

Collaborations

Richard Frentzel has collaborated with notable professionals such as William C Allison and Diane Scott, contributing valuable insights to projects aimed at improving polishing processes and technologies. These collaborations have not only helped him refine his inventions but also fostered a spirit of innovation within the industry.

Conclusion

Richard Frentzel's innovative spirit and dedication to advancing polishing technology through his patents make him an exemplary figure in the realm of inventors. His contributions, particularly in low-density and homogeneous polishing pads, highlight the significant role inventors play in enhancing industry standards. As he continues to innovate, the semiconductor industry can expect further advancements that will streamline and improve production processes.