For the Inventor, By the Inventor

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Wilmington, DE, United States of America

Rodel Holdings, Inc.

USPTO Granted Patents = 93

% Expired Patents = 12.9

Forward Citations = 1,749

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87 inventors (with patents filed for the assignee):

Lee Melbourne Cook (32 out of 59 patents)

David B James (30 out of 65 patents)

John V H Roberts (19 out of 28 patents)

4. William D Budinger (13 out of 30 patents)

5. Michael R Oliver (12 out of 17 patents)

6. Heinz F Reinhardt (11 out of 17 patents)

7. Peter A Burke (11 out of 29 patents)

8. Terence M Thomas (10 out of 23 patents)

9. Craig D Lack (9 out of 13 patents)

10. Nina G Chechik (9 out of 10 patents)

11. Paul J Yancey (8 out of 8 patents)

12. Richard M Levering, Jr (8 out of 8 patents)

13. James Shen (7 out of 8 patents)

14. Charles William Jenkins (6 out of 8 patents)

15. John V Roberts (6 out of 14 patents)

Core Competencies:

Polishing Pads

Chemical Mechanical Planarization

Polishing Compositions

Semiconductor Substrates

Optical Window

Air Elimination

Film Removal Rates

Micro-Texture

CMP Slurry

Polymeric Pads

Surface Regeneration

Flocked Fibers

93 patents: Sort by Forward Citations

1. 6749485 - Hydrolytically stable grooved polishing pads for chemical mechanical planarization (2004-06-15),

2. 6739962 - Polishing pads and methods relating thereto (2004-05-25),

3. 6736709 - Grooved polishing pads for chemical mechanical planarization (2004-05-18),

4. 6722249 - Method of fabricating a polishing pad having an optical window (2004-04-20),

5. 6699299 - Composition and method for polishing in metal CMP (2004-03-02),

6. 6699104 - Elimination of trapped air under polishing pads (2004-03-02),

7. 6693035 - Methods to control film removal rates for improved polishing in metal CMP (2004-02-17),

8. 6685757 - Polishing composition (2004-02-03),

9. 6682402 - Polishing pads and methods relating thereto (2004-01-27),

10. 6679928 - Polishing composition having a surfactant (2004-01-20),

11. 6679769 - Polishing pad having an advantageous micro-texture and methods relating thereto (2004-01-20),

12. 6676718 - Polishing of semiconductor substrates (2004-01-13),

13. 6676483 - Anti-scattering layer for polishing pad windows (2004-01-13),

14. 6648733 - Polishing pads and methods relating thereto (2003-11-18),

15. 6641631 - Polishing of semiconductor substrates (2003-11-04),

Company Overview

Rodel Holdings, Inc., based in Wilmington, DE, specializes in the development and manufacturing of advanced materials for chemical mechanical polishing (CMP) applications. The company focuses on innovative solutions such as polishing pads and compositions that enhance the performance of semiconductor substrates and optical windows. Rodel's expertise in air elimination and film removal rates, along with its commitment to micro-texture technology, positions it as a key player in the semiconductor and electronics industries.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

93 Patents

#60 in Wilmington, DE

#74 in Delaware

#4,029 in US

#8,291 in the World

Wilmington, DE, United States of America

Rodel Holdings, Inc.

Forward Citations = 1,749

87 inventors:

Lee Melbourne Cook (32 out of 59 patents)

David B James (30 out of 65 patents)

John V H Roberts (19 out of 28 patents)

4. William D Budinger (13 out of 30 patents)

5. Michael R Oliver (12 out of 17 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Rodel Holdings, Inc.. Retrieved from https://idiyas.com/company/rodel-holdings

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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