The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2004
Filed:
Feb. 21, 2002
Applicant:
Inventors:
Haofeng Xu, Newark, DE (US);
John Quanci, Haddonfield, NJ (US);
Assignee:
Rodel Holdings, Inc., Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 ; C09G 1/04 ;
U.S. Cl.
CPC ...
C09G 1/02 ; C09G 1/04 ;
Abstract
A polishing composition for polishing a semiconductor wafer includes comprises water, an abrasive that is preferably colloidal silica, water-soluble cellulose having a molecular weight of at least about 1,000,000 and an alkaline compound that is preferably ammonia. Tetra methyl ammonium hydroxide may also be added to the polishing composition.
Xu, Haofeng. (2004). Polishing composition (U.S. Patent No. 6685757). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6685757
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile