The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2004
Filed:
Mar. 20, 2003
Vikas Sachan, Hockessin, DE (US);
Elizabeth A. (Kegerise) Langlois, Newark, DE (US);
Qianqiu (Christine) Ye, Wilmington, DE (US);
Keith G. Pierce, Colorado Springs, CO (US);
Craig D. Lack, Wilmington, DE (US);
Terence M. Thomas, Newark, DE (US);
Peter A. Burke, Avondale, PA (US);
David Gettman, Bear, DE (US);
Sarah Lane, Elkton, MD (US);
Rodel Holdings, Inc., Wilmington, DE (US);
Abstract
A composition is provided in the present invention for polishing a composite semiconductor structure containing a metal layer (such as tungsten, aluminum, or copper), a barrier layer (such as tantalum, tantalum nitride, titanium, or titanium nitride), and an insulating layer (such as SiO ). The composition comprises an aqueous medium, an oxidant, an organic polymer that attenuates removal of the oxide film. The composition may optionally comprise a complexing agent and/or a dispersant.