Elizabeth A (Kegerise) Langlois

Title: Innovations of Elizabeth A (Kegerise) Langlois

Introduction

Elizabeth A (Kegerise) Langlois is a notable inventor based in Newark, DE (US). She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work primarily focuses on improving processes related to chemical mechanical planarization (CMP) in semiconductor manufacturing.

Latest Patents

Langlois's latest patents include innovative compositions and methods for polishing in metal CMP. One of her patents describes a composition for polishing a composite semiconductor structure that includes a metal layer, a barrier layer, and an insulating layer. This composition features an aqueous medium, an oxidant, and an organic polymer that helps control the removal of the oxide film. Another patent outlines a method for chemical mechanical planarization that employs a two-step polishing process. This method ensures minimal removal of the barrier or liner layer during the first step and focuses on preserving the integrity of the underlying dielectric layer during the second step.

Career Highlights

Elizabeth Langlois is currently associated with Rodel Holdings, Inc., where she continues to advance her research and development efforts in semiconductor technologies. Her expertise in CMP processes has positioned her as a valuable asset in her field.

Collaborations

Throughout her career, Langlois has collaborated with notable professionals, including Vikas Sachan and Keith G Pierce. These collaborations have contributed to her innovative approaches and successful patent applications.

Conclusion

Elizabeth A (Kegerise) Langlois is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the industry. Her contributions through her patents and collaborations highlight her commitment to innovation and excellence in her field.