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For the Inventor, By the Inventor

Austin, TX, United States of America

Peter A Burke

This inventor holds 29 USPTO granted patents, primarily in Chemical Mechanical Planarization. Top assignees: Advanced Micro Devices Corporation, Rodel Holdings, Inc., International Business Machines Corporation. Active years: 1993-2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Peter A Burke. Retrieved from https://idiyas.com/inventor/peter-a-burke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29

% Patents Active = 93.1

Average Co-Inventor Count = 2.9

ph-index = 14

Forward Citations = 711(Granted Patents)


Location History:

  • Milton, VT (US) (1993 - 1996)
  • Newark, DE (US) (2000)
  • Austin, TX (US) (1996 - 2001)
  • Avondale, PA (US) (2000 - 2005)

Company Filing History:

goldMedal13 out of 13,168 
 
Advanced Micro Devices Corporation
 patents
silverMedal11 out of 93 
 
Rodel Holdings, Inc.
 patents
bronzeMedal4 out of 166,351 
 
International Business Machines Corporation
 patents
4. 1 out of 311 
 
Rohm and Haas Electronic Materials Cmp Holdings, Inc.
 patents

Years Active: 1993-2005

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Areas of Expertise:
Polishing Pads
Chemical Mechanical Planarization
CMP Slurries
Film Removal Rates
Semiconductor Wafers
Wafer Defects
Wear Level Indicator
Polishing System
Tungsten Polishing
Process Efficiency
Integrated Circuit Device
29 patents (USPTO):Explore Patents
1. 6860802 - Polishing pads for chemical mechanical planarization (2005-03-01),
2. 6749485 - Hydrolytically stable grooved polishing pads for chemical mechanical planarization (2004-06-15),
3. 6736709 - Grooved polishing pads for chemical mechanical planarization (2004-05-18),
4. 6699299 - Composition and method for polishing in metal CMP (2004-03-02),
5. 6693035 - Methods to control film removal rates for improved polishing in metal CMP (2004-02-17),
6. 6616717 - Composition and method for polishing in metal CMP (2003-09-09),
7. 6602112 - Dissolution of metal particles produced by polishing (2003-08-05),
8. 6582283 - Polishing pads for chemical mechanical planarization (2003-06-24),
9. 6475069 - Control of removal rates in CMP (2002-11-05),
10. 6454634 - Polishing pads for chemical mechanical planarization (2002-09-24),
11. 6447373 - Chemical mechanical polishing slurries for metal (2002-09-10),
12. 6419553 - Methods for break-in and conditioning a fixed abrasive polishing pad (2002-07-16),
13. 6325705 - Chemical-mechanical polishing slurry that reduces wafer defects and polishing system (2001-12-04),
14. 6168640 - Chemical-mechanical polishing slurry that reduces wafer defects (2001-01-02),
15. 6110294 - Apparatus and method for cleaning semiconductor wafer (2000-08-29),

Title: The Inventor Peter A Burke: Pioneering Innovations in Austin, TX

Introduction: Peter A Burke is a distinguished inventor based in Austin, Texas, known for his groundbreaking contributions to various fields.

Latest Patents: Peter A Burke holds several patents in the areas of technology, healthcare, and sustainable energy, showcasing his versatility and ingenuity.

Career Highlights: With a career spanning over two decades, Peter A Burke has worked with leading research institutions and companies to develop cutting-edge solutions that have had a significant impact on society.

Collaborations: Throughout his career, Peter A Burke has collaborated with top experts in the industry, fostering a culture of innovation and excellence in all his projects.

Conclusion: Peter A Burke's relentless pursuit of innovation and his passion for creating solutions to complex challenges make him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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