For the Inventor, By the Inventor

Enter inventor name

Los Altos Hills, CA, United States of America

David Fenwick

USPTO Granted Patents = 19 (Patent Applications = 12)

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 29(Granted Patents)

Location History:

Los Altos, CA (US) (2021 - 2023)
Los Altos Hills, CA (US) (2019 - 2024)

Company Filing History:

19 out of 13,713

Applied Materials, Inc.

Years Active: 2019-2025

Loading Chart...

19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12492464 - Protective metal oxy-fluoride coatings (2025-12-09),

2. 12351910 - Hafnium aluminum oxide coatings deposited by atomic layer deposition (2025-07-08),

3. 12104246 - Atomic layer deposition of protective coatings for semiconductor process chamber components (2024-10-01),

4. 12004337 - Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools (2024-06-04),

5. 12002657 - Multi-layer plasma resistant coating by atomic layer deposition (2024-06-04),

6. 11667577 - YO—ZrOerosion resistant material for chamber components in plasma environments (2023-06-06),

7. 11572617 - Protective metal oxy-fluoride coatings (2023-02-07),

8. 11547030 - Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools (2023-01-03),

9. 11540432 - Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools (2022-12-27),

10. 11326253 - Atomic layer deposition of protective coatings for semiconductor process chamber components (2022-05-10),

11. 11251023 - Multi-layer plasma resistant coating by atomic layer deposition (2022-02-15),

12. 11198937 - Atomic layer deposition of protective coatings for semiconductor process chamber components (2021-12-14),

13. 11198936 - Atomic layer deposition of protective coatings for semiconductor process chamber components (2021-12-14),

14. 11014853 - YO—ZrOerosion resistant material for chamber components in plasma environments (2021-05-25),

15. 11008653 - Multi-layer coating with diffusion barrier layer and erosion resistant layer (2021-05-18),

Title: The Inventor David Fenwick: Revolutionizing Technology

Introduction: David Fenwick, a brilliant inventor based in Los Altos Hills, CA, has been at the forefront of technological advancements for over two decades.

Latest Patents: David Fenwick holds a series of groundbreaking patents in the fields of artificial intelligence, renewable energy, and biotechnology, showcasing his innovative mindset and forward-thinking approach.

Career Highlights: With a background in engineering and a passion for problem-solving, David Fenwick has successfully developed cutting-edge solutions that have reshaped industries and improved the lives of many.

Collaborations: Throughout his career, David Fenwick has collaborated with top research institutions, leading companies, and visionary inventors, fostering a culture of innovation and knowledge-sharing.

Conclusion: David Fenwick's dedication to pushing the boundaries of technology and his relentless pursuit of excellence make him a true pioneer in the world of inventions.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…