The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2024

Filed:

Apr. 11, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

David Fenwick, Los Altos, CA (US);

Jennifer Y. Sun, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 28/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); C23C 16/40 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/4408 (2013.01); C23C 16/45529 (2013.01); C23C 16/45531 (2013.01); C23C 28/042 (2013.01);
Abstract

A method comprises depositing a first layer of aluminum oxide onto a surface of a chamber component via atomic layer deposition (ALD). The method further comprises depositing a second layer of yttrium oxide onto a surface of the chamber component via ALD, depositing a third layer of zirconium oxide onto the surface of the chamber component via ALD, and forming a corrosion and erosion resistant coating comprising a YZrOsolid state phase of the second layer and the third layer, wherein x and y have values that are based on a number of repetitions of the atomic layer deposition process that are used to deposit the second layer and a number of repetitions of the atomic layer deposition process that are used to deposit the third layer.


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