The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
Nov. 23, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xiaowei Wu, San Jose, CA (US);
David Fenwick, Los Altos Hills, CA (US);
Jennifer Y. Sun, Mountain View, CA (US);
Guodong Zhan, Woodlands, TX (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 17/06 (2006.01); C23C 16/04 (2006.01); C23C 16/06 (2006.01); C23C 16/40 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); C23C 16/045 (2013.01); C23C 16/06 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/4404 (2013.01); C23C 16/45527 (2013.01); C23C 16/45529 (2013.01); C23C 16/45531 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01); H01L 21/67028 (2013.01); H01L 21/67069 (2013.01);
Abstract
Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of an article using an atomic layer deposition (ALD) process. The plasma resistant coating has a first layer and a second layer including a solid solution of YO—ZrOand uniformly covers features, such as those having an aspect ratio of length to width of about 3:1 to about 300:1.