Company Filing History:
7 out of 10 
6 out of 8 
1 out of 1 Years Active: 2011-2017
Title: **David Adam Wells: A Pioneer in Chemical Mechanical Planarization Technology**
Introduction
David Adam Wells, based in Hudson, NH, is a notable inventor with an impressive portfolio of 14 patents. His work primarily revolves around advancements in chemical-mechanical planarization technology, which plays a significant role in semiconductor manufacturing and other precision applications.
Latest Patents
Among his latest innovations, Wells has developed several groundbreaking patents. One such patent is for a **multi-layered chemical-mechanical planarization pad**. This pad includes a first component made of both a water-soluble and water-insoluble composition, designed to enhance the efficiency of chemical mechanical planarization processes. The unique attributes of this pad allow for a more refined polishing technique through its design, incorporating fibers into its structure.
Another significant patent by Wells focuses on a **polishing pad having micro-grooves on the pad surface**. This polishing pad introduces a multitude of soluble fibers, creating micro-grooves that can optimize the polishing process. With grooves that can measure up to about 150 micrometers in width and depth, this innovation represents a significant step forward in the versatility and effectiveness of polishing pads.
Career Highlights
David Adam Wells has made substantial contributions to his field, working with prominent companies such as Innopad, Inc. and FNS Tech Co., Ltd. His experience in these organizations has not only helped him hone his skills but also facilitated the development of his patented technologies that are essential to the industry.
Collaborations
Throughout his career, Wells has collaborated with respected colleagues, notably Oscar K Hsu and Paul Lefevre. These partnerships have enabled the exchange of ideas and fostered innovation within their shared sphere of expertise.
Conclusion
David Adam Wells exemplifies the spirit of innovation and dedication to advancing technology in chemical-mechanical planarization. With his impressive number of patents and collaborations, he continues to influence the industry and inspire future inventors and researchers. His contributions signify the importance of ongoing development in precision manufacturing technologies.