The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
May. 06, 2013
Innopad, Inc., Wilminton, MA (US);
Paul LeFevre, Topsfield, MA (US);
Anoop Mathew, Peabody, MA (US);
Scott Xin Qiao, Lexington, MA (US);
Guangwei Wu, Sunnyvale, CA (US);
David Adam Wells, Hudson, NH (US);
Oscar K. Hsu, Chelmsford, MA (US);
FNS TECH CO., LTD, Cheonan-Si, KR;
Abstract
An aspect of the present disclosure relates to a chemical mechanical planarization pad including a first domain and a second continuous domain wherein the first domain includes discrete elements regularly spaced within the second continuous domain. The pad may be formed by forming a plurality of openings for a first domain within a second continuous domain of the pad, wherein the openings are regularly spaced within the second domain, and forming the first domain within the plurality of openings in second continuous domain. In addition, the pad may be used in polishing a substrate with a polishing slurry.