The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Jul. 24, 2008
Paul Lefevre, Topsfield, MA (US);
Oscar K. Hsu, Chelmsford, MA (US);
David Adam Wells, Hudson, NH (US);
John Erik Aldeborgh, Boxford, MA (US);
Marc C. Jin, Boston, MA (US);
Paul Lefevre, Topsfield, MA (US);
Oscar K. Hsu, Chelmsford, MA (US);
David Adam Wells, Hudson, NH (US);
John Erik Aldeborgh, Boxford, MA (US);
Marc C. Jin, Boston, MA (US);
Innopad, Inc., Peabody, MA (US);
Abstract
A chemical mechanical polishing pad. The pad includes a surface and a polymer matrix capable of transmitting at least a portion of incident radiation. In addition, at least one embedded structure in the polymer matrix, including a portion of the pad where the embedded structure is not present, and a window integral to the pad defined by the portion of the pad where the embedded structure is not present.