The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 01, 2014
Filed:
Aug. 04, 2008
Paul Lefevre, Topsfield, MA (US);
Oscar K. Hsu, Chelmsford, MA (US);
David Adam Wells, Hudson, NH (US);
Scott Xin Qiao, Macungie, PA (US);
Anoop Mathew, Peabody, MA (US);
Guangwei Wu, Sunnyvale, CA (US);
Paul Lefevre, Topsfield, MA (US);
Oscar K. Hsu, Chelmsford, MA (US);
David Adam Wells, Hudson, NH (US);
Scott Xin Qiao, Macungie, PA (US);
Anoop Mathew, Peabody, MA (US);
Guangwei Wu, Sunnyvale, CA (US);
FNS Tech Co., Ltd., Cheonan-Si, KR;
Abstract
A polishing pad and a method of producing a polishing pad. The method includes providing a mold, having a first cavity and a second cavity, wherein the first cavity defines a recess, providing a polymer matrix material including void forming elements in the recess, forming a polishing pad and removing at least a portion of the elements from the polishing pad forming void spaces within the polishing pad by one of a chemical method or mechanical method, prior to use in chemical/mechanical planarization procedures.