The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 30, 2013

Filed:

Dec. 31, 2008
Applicants:

Oscar K. Hsu, Chelmsford, MA (US);

Paul Lefevre, Topsfield, MA (US);

Marc C. Jin, Boston, MA (US);

John Erik Aldeborgh, Boxford, MA (US);

David Adam Wells, Hudson, NH (US);

Inventors:

Oscar K. Hsu, Chelmsford, MA (US);

Paul Lefevre, Topsfield, MA (US);

Marc C. Jin, Boston, MA (US);

John Erik Aldeborgh, Boxford, MA (US);

David Adam Wells, Hudson, NH (US);

Assignee:

Innopad, Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24D 11/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present disclosure relates to a polishing pad. The polishing pad may include a polymer layer having a three-dimensional network therein and a composite layer having the ability to equalize pressure across the pad surface, including a first adhesive wherein the composite exhibits a hydrostatic modulus of 1 to 500 psi when compressed at a pressure of 1 to 50 psi.


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