Chih-Ching Lin is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on innovative semiconductor structures and manufacturing methods that enhance the efficiency and functionality of electronic devices.

Latest Patents

Among his latest patents is a semiconductor structure having vias with different dimensions. This invention provides a novel semiconductor structure that includes a first wafer with a first substrate, a first dielectric layer, and a first conductive pad. Additionally, it features a second wafer with a second dielectric layer, a second substrate, and a second conductive pad. The structure is designed to improve the performance of semiconductor devices by utilizing conductive vias of varying dimensions. Another significant patent is the method of manufacturing this semiconductor structure, which outlines the steps for creating the innovative design, ensuring precision and reliability in production.

Career Highlights

Chih-Ching Lin is currently employed at Nan Ya Technology Corporation, where he continues to push the boundaries of semiconductor innovation. His expertise and dedication to research have positioned him as a key figure in the development of advanced semiconductor technologies.

Collaborations

Chih-Ching Lin has collaborated with notable coworkers, including Yi-Nan Chen and Shing-Yih Shih. Their combined efforts contribute to the advancement of semiconductor research and development within their organization.

Conclusion

Chih-Ching Lin's contributions to semiconductor technology through his patents and work at Nan Ya Technology Corporation highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of electronic devices.

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