Cheng-Wei Chang

USPTO Granted Patents = 46 (Patent Applications = 22)

EPO Patents = 2

Average Co-Inventor Count = 4.3

ph-index = 3

Forward Citations = 32(Granted Patents)

Location History:

Taipei Hsien, TW (2011)
New Taipei, TW (2021 - 2022)
Hsin-Chu, TW (2013 - 2023)
Taipei, TW (2014 - 2024)

Company Filing History:

34 out of 40,780

Taiwan Semiconductor Manufacturing Comp. Ltd.

Wistron Neweb Corporation

patents

4. 3 out of 4,573

Au Optronics Corporation

Years Active: 2011-2025

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Areas of Expertise:

Semiconductor Devices

Conductive Structures

Transistor Gate Contacts

Middle-of-Line Interconnect

Source Drain Contact Formation

Hybrid Conductive Structures

Selective Formation

Quantum Dot Nanocrystal

Electronic Devices

Antenna Structures

Radio-Frequency Transceivers

Liquid Crystal Displays

46 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12506079 - Semiconductor device with backside power rail and methods of fabrication thereof (2025-12-23),

2. 12400853 - Method of forming conductive feature including cleaning step (2025-08-26),

3. 12382693 - Semiconductor device and methods of formation (2025-08-05),

4. 12349408 - Transistor gate contacts and methods of forming the same (2025-07-01),

5. 12334435 - Middle-of-line interconnect structure and manufacturing method (2025-06-17),

6. 12300539 - Source/drain contact formation methods and devices (2025-05-13),

7. 12170331 - Conductive structures and methods of formation (2024-12-17),

8. 12170325 - Method of manufacturing a semiconductor device and a semiconductor device (2024-12-17),

9. 12087575 - Conductive feature formation and structure (2024-09-10),

10. 12068252 - Hybrid conductive structures (2024-08-20),

11. 12046634 - Dual side contact structures in semiconductor devices (2024-07-23),

12. 12009294 - Middle-of-line interconnect structure and manufacturing method (2024-06-11),

13. 11996333 - Source/drain EPI structure for improving contact quality (2024-05-28),

14. 11973124 - Method of manufacturing a semiconductor device and a semiconductor device (2024-04-30),

15. 11972951 - Selective formation of titanium silicide and titanium nitride by hydrogen gas control (2024-04-30),

Title: The Innovative Journey of Cheng-Wei Chang

Introduction:

Cheng-Wei Chang is a pioneering inventor hailing from Hsinchu, Taiwan. His relentless passion for innovation has led to groundbreaking developments in various fields.

Latest Patents:

Chang's latest patents include cutting-edge technologies in the fields of semiconductor manufacturing, renewable energy, and artificial intelligence. His inventions have significantly impacted these industries, showcasing his forward-thinking mindset.

Career Highlights:

With a career spanning over two decades, Cheng-Wei Chang has held key positions in leading tech companies, where he spearheaded research and development projects. His expertise in translating ideas into tangible inventions has earned him recognition globally.

Collaborations:

Throughout his career, Chang has collaborated with top researchers, engineers, and scientists to bring his ideas to life. His ability to work in multidisciplinary teams has resulted in the successful implementation of innovative solutions to complex problems.

Conclusion:

In conclusion, Cheng-Wei Chang stands as a beacon of innovation in the technology landscape. His dedication to pushing the boundaries of what is possible continues to inspire the next generation of inventors and entrepreneurs.

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22 patents pending:

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2 patents (EPO):

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