Somers, NY, United States of America

Chao-Kun Hu

USPTO Granted Patents = 41 

 

Average Co-Inventor Count = 4.7

ph-index = 16

Forward Citations = 1,326(Granted Patents)


Location History:

  • Sommers, NY (US) (2002)
  • Yorktown Heights, NY (US) (2011 - 2015)
  • Somers, NY (US) (1991 - 2023)

Company Filing History:


Years Active: 1991-2023

where 'Filed Patents' based on already Granted Patents

41 patents (USPTO):

Title: Innovator Spotlight: Chao-Kun Hu - Pioneering Inventions in Semiconductor Technology

Introduction:

In the realm of semiconductor technology, Chao-Kun Hu has emerged as a pivotal figure with his groundbreaking innovations and patents. Hailing from Somers, NY, US, Chao-Kun Hu's inventive spirit has led to the development of cutting-edge electrode structures and techniques for enhancing reliability in Cu interconnects.

Latest Patents:

Chao-Kun Hu's latest patents showcase his ingenuity in the field. One of his notable inventions includes an "Electrode with alloy interface," which introduces a novel method of forming a contact structure using alloy AB. Additionally, his patent on "Techniques to improve reliability in Cu interconnects using Cu intermetallics" demonstrates his commitment to advancing the performance and durability of Cu interconnects in semiconductor devices.

Career Highlights:

Having accumulated a remarkable 41 patents, Chao-Kun Hu has made significant contributions to the industry. He has lent his expertise to renowned companies such as IBM (International Business Machines Corporation) and STMicroelectronics GmbH, where his innovative solutions have helped shape the landscape of semiconductor technology.

Collaborations:

Throughout his career, Chao-Kun Hu has collaborated with esteemed professionals in the field. Some of his notable coworkers include Andrew Herbert Simon and Chih-Chao Yang, who have worked alongside him to bring his visionary ideas to fruition and drive forward advancements in semiconductor technology.

Conclusion:

In conclusion, Chao-Kun Hu's inventive prowess and dedication to pushing the boundaries of semiconductor technology have solidified his reputation as a trailblazing innovator. His patents stand as testament to his relentless pursuit of excellence and his unwavering commitment to driving progress in the industry. Chao-Kun Hu's contributions continue to inspire and shape the future of semiconductor technology, leaving an indelible mark on the field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…