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For the Inventor, By the Inventor

Seoul, South Korea

Byung-Gook Kim

This inventor holds 23 USPTO granted patents and 4 published patent applications, primarily in Photomask Technology. Top assignees: Samsung Electronics Co., Ltd., Sungkyunkwan University, Lg Electronics Inc.. Active years: 2008-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Byung-Gook Kim. Retrieved from https://idiyas.com/inventor/byung-gook-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 23 

% Patents Active = 78.3

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 32(Granted Patents)


Location History:

  • Seoul, KR (2008 - 2022)
  • Suwon-si, KR (2011 - 2022)

Company Filing History:

goldMedal22 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents
silverMedal2 out of 1,357 
 
Sungkyunkwan University
 patents
bronzeMedal1 out of 51,830 
 
Lg Electronics Inc.
 patents
4. 1 out of 1,486 
 
Yonsei University
 patents
where one patent can have more than one assignee

Years Active: 2008-2022

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Areas of Expertise:
Photomask
Pellicle
Semiconductor Devices
Data Encryption
Optical Device
Surface Inspection
Pattern Formation
Resource Management
Radio Resource Allocation
Photoresist Patterns
Critical Dimension Measurement
Exposure Apparatus
23 patents (USPTO):Explore Patents
1. 11415889 - Chemical supply structure and a developing apparatus having the same (2022-08-16),
2. 11381388 - Storage device sharing data encryption key as encrypted and operating method of storage device (2022-07-05),
3. 10437145 - Method of detaching a pellicle from a photomask (2019-10-08),
4. 10073337 - Pellicle and photomask assembly including the same (2018-09-11),
5. 10065402 - Method of manufacturing pellicle assembly and method of photomask assembly including the same (2018-09-04),
6. 10042246 - Method of manufacturing photomask (2018-08-07),
7. 9897554 - Method of inspecting surface and method of inspecting photomask using the same (2018-02-20),
8. 9892500 - Method for grouping region of interest of mask pattern and measuring critical dimension of mask pattern using the same (2018-02-13),
9. 9880462 - Pellicle and exposure mask including the same (2018-01-30),
10. 9817309 - Photomasks, methods of fabricating the photomasks, and method of fabricating semiconductor devices by using the photomasks (2017-11-14),
11. 9798241 - Methods of manufacturing photomasks, methods of forming photoresist patterns and methods of manufacturing semiconductor devices (2017-10-24),
12. 9690190 - Pellicles and methods of manufacturing the same (2017-06-27),
13. 9417518 - Photomask and method of manufacturing the same (2016-08-16),
14. 8817234 - Optical device and exposure apparatus including the same (2014-08-26),
15. 8673522 - Method for manufacturing photomask and photomask manufactured using the same (2014-03-18),

Title: Inventor Byung-Gook Kim

Introduction: Byung-Gook Kim is a renowned inventor based in Seoul, South Korea, known for his groundbreaking contributions to various technological fields.

Latest Patents: Byung-Gook Kim holds several patents in the areas of electronics, telecommunications, and renewable energy, showcasing his innovative mindset and expertise in diverse sectors.

Career Highlights: With a career spanning over two decades, Byung-Gook Kim has worked for leading tech companies, where he spearheaded research and development projects that led to significant advancements in the industry.

Collaborations: Throughout his career, Byung-Gook Kim has collaborated with top researchers, engineers, and scientists globally, fostering a culture of innovation and knowledge exchange.

Conclusion: Byung-Gook Kim's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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