The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2017
Filed:
Dec. 15, 2015
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Mun-Ja Kim, Suwon-si, KR;
Tae-Sung Kim, Suwon-si, KR;
Ji-Beom Yoo, Seoul, KR;
Byung-Gook Kim, Seoul, KR;
Soo-Young Kim, Suwon-si, KR;
Dong-Wook Shin, Changwon-si, KR;
Jae-Hyuck Choi, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-Si, Gyeonggi-Do, KR;
SUNGKYUNKWAN UNIVERSITY'S RESEARCH & BUSINESS FOUNDATION, Suwon-Si, Gyeonggi-Do, KR;
Abstract
A method of manufacturing a pellicle includes forming a membrane on a first surface of a substrate from a chemical reaction in which the substrate serves as a catalyst, forming a protective pattern on a second surface of the substrate, immersing the substrate in an etchant solution, such that a portion of the substrate exposed through the protective pattern is removed to form a frame, and replacing the etchant solution with a solvent.