The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2016
Filed:
Mar. 18, 2014
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Jong-Keun Oh, Seoul, KR;
Hyung-Ho Ko, Hwaseong-si, KR;
Byung-Gook Kim, Seoul, KR;
Jae-Hyuck Choi, Seoul, KR;
Jun-Youl Choi, Seoul, KR;
Assignee:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/48 (2012.01); G03F 1/54 (2012.01);
U.S. Cl.
CPC ...
G03F 1/48 (2013.01); G03F 1/54 (2013.01);
Abstract
A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Oh, Jong-Keun. (2016). Photomask and method of manufacturing the same (U.S. Patent No. 9417518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9417518
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile