IDiyas

For the Inventor, By the Inventor

Hwaseong-si, South Korea

Hyung-ho Ko

USPTO Granted Patents = 11

Average Co-Inventor Count = 4.9

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:

goldMedal11 out of 131,214 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2011-2019

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11 patents (USPTO):Explore Patents
1. 10474034 - Phase shift mask (2019-11-12),
2. 10042246 - Method of manufacturing photomask (2018-08-07),
3. 9989857 - Photomask and method of forming the same and methods of manufacturing electronic device and display device using the photomask (2018-06-05),
4. 9417518 - Photomask and method of manufacturing the same (2016-08-16),
5. 9370805 - Method of megasonic cleaning of an object (2016-06-21),
6. 9341941 - Reflective photomask blank, reflective photomask, and integrated circuit device manufactured by using reflective photomask (2016-05-17),
7. 9122177 - Apparatus for cleaning photomask (2015-09-01),
8. 8784672 - Photomasks and methods of manufacturing the same (2014-07-22),
9. 8414708 - Method and apparatus for cleaning photomask (2013-04-09),
10. 8293020 - Method of megasonic cleaning of an object (2012-10-23),
11. 7989123 - Photomask including ion trapping layer and method of manufacturing semiconductor device using the photomask (2011-08-02),

Title: **Innovative Contributions of Hyung-ho Ko in Photomask Technology**

Introduction

Hyung-ho Ko, an esteemed inventor based in Hwaseong-si, South Korea, has made significant strides in the field of photomask technology. With a remarkable portfolio totaling 11 patents, he continues to push the boundaries of innovation, particularly within his role at Samsung Electronics Co., Ltd.

Latest Patents

Among his latest inventions, Hyung-ho Ko has developed a phase shift mask. This innovative phase shift mask includes a substrate with a second phase shift pattern that extends to the outermost perimeter of the substrate. The second phase shift pattern is formed from a material that is semi-transmissive to light of a first wavelength, allowing the mask to transmit approximately 2 to 10% of this light at the second phase shift pattern. Additionally, he has created a method for manufacturing photomasks, which consists of a transparent substrate, a mask pattern, and a protective layer pattern designed to cover the side walls of the mask pattern while leaving the top of this protective layer exposed.

Career Highlights

Hyung-ho Ko's contributions to Samsung Electronics have been pivotal, as he has been instrumental in developing advanced technologies that enhance photolithography processes. His focus on integrating phase shift masks has set new standards for precision in semiconductor fabrication, making him a key figure in the field.

Collaborations

Throughout his career, Ko has collaborated with talented professionals such as Jong-Keun Oh and Jae-Hyuck Choi. Their combined expertise has fueled innovative solutions that address complex challenges in photomask production and semiconductor technology.

Conclusion

Hyung-ho Ko stands out as a visionary inventor in the realm of photomasks, continually driving innovation at Samsung Electronics Co., Ltd. His latest patents reflect a deep understanding of the intricate needs of the semiconductor industry. As he moves forward, his work will undoubtedly continue to influence future advancements in this vital technological field.

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