The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Oct. 24, 2011
Jong-keun OH, Seoul, KR;
Dae-hyuk Kang, Hwaseong-si, KR;
Chan-uk Jeon, Seongnam-si, KR;
Hyung-ho Ko, Hwaseong-si, KR;
Sung-jae Han, Seongnam-si, KR;
Jung-jin Kim, Hwaseong-si, KR;
Jong-Keun Oh, Seoul, KR;
Dae-Hyuk Kang, Hwaseong-si, KR;
Chan-Uk Jeon, Seongnam-si, KR;
Hyung-Ho Ko, Hwaseong-si, KR;
Sung-Jae Han, Seongnam-si, KR;
Jung-Jin Kim, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
In a method of manufacturing a photomask pattern, a light-shielding layer pattern and an anti-reflective layer pattern are formed sequentially on a transparent substrate. Oxidation and nitridation processes are performed on a sidewall of the light-shielding layer pattern to form a protection layer pattern on a lateral portion of the light-shielding layer pattern.