Location History:
- SeongNam, KR (2010)
- Seongnam-si, KR (2009 - 2017)
Company Filing History:
Years Active: 2009-2017
Title: Innovations of Chan-Uk Jeon
Introduction
Chan-Uk Jeon is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the fields of semiconductor manufacturing and cleaning technologies. With a total of 11 patents, his work has had a substantial impact on the industry.
Latest Patents
Among his latest patents are methods of manufacturing photomasks, methods of forming photoresist patterns, and methods of manufacturing semiconductor devices. One notable method involves patterning a photoresist layer by forming it on a substrate, exposing it to light from a first light source to induce a chemical change, and then performing a post-exposure bake process. This process includes irradiating the photoresist layer with at least two shots of laser light from a second light source, heating it to a first temperature, and subsequently developing the photoresist layer to selectively remove portions of it. Another innovative patent is a megasonic cleaning method, which utilizes microcavitation bubbles formed by applying an electromotive force to a cleaning solution. This method effectively cleans surfaces while preventing pattern damage.
Career Highlights
Chan-Uk Jeon has worked with notable companies such as Samsung Electronics and Fine Semitech Corporation. His experience in these leading firms has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry.
Collaborations
Throughout his career, Chan-Uk Jeon has collaborated with talented individuals, including Hyung-ho Ko and Jae-Hyuck Choi. These partnerships have fostered innovation and enhanced the development of new technologies.
Conclusion
Chan-Uk Jeon's contributions to the field of semiconductor manufacturing and cleaning technologies are noteworthy. His innovative patents and collaborations reflect his commitment to advancing technology in these critical areas.