Santa Clara, CA, United States of America

Anisul Haque Khan

This inventor holds 32 USPTO granted patents and 3 published patent applications, primarily in Plasma Etching Technology. Top assignees: Applied Materials, Inc., Other. Active years: 2001-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Anisul Haque Khan. Retrieved from https://idiyas.com/inventor/anisul-haque-khan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 32 

% Patents Active = 56.3

Average Co-Inventor Count = 4.4

ph-index = 11

Forward Citations = 611(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2001 - 2005)
  • Santa Clara, CA (US) (2003 - 2022)

Company Filing History:


Years Active: 2001-2022

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Areas of Expertise:
Plasma Etching
Silicon Trench
NAND Structures
Thermo-Optic Switches
High Etch Rates
Silicon-Germanium
Deep Trenches
Anodized Chamber Parts
Temperature Control
Multi-Layer Coating
Micromachining
Conductors Etching
32 patents (USPTO):Explore Patents

Title: Anisul Haque Khan: A Pioneer in Multilayer Coating Technologies

Introduction

Anisul Haque Khan, based in Santa Clara, CA, has established himself as a prominent inventor with an impressive portfolio of 32 patents. His research primarily focuses on cutting-edge technologies in coating methods and plasma reactors, demonstrating a significant contribution to the field of materials science.

Latest Patents

Among his latest innovative patents is the "Amorphous carbon multilayer coating with directional protection." This patent describes a high throughput method for applying directional protection to three-dimensional features on a substrate. The innovative process includes forming a multi-layer amorphous carbon-containing coating with tunable conformality, utilizing a strategically deposited base layer and a second layer where each employs materials with specific sticking coefficients. This technique also outlines a method for manufacturing three-dimensional devices, showcasing Anisul's ability to blend theoretical chemistry with practical applications.

Another notable patent is the "Method of matching two or more plasma reactors." This invention focuses on capturing etch rate distributions relative to hardware tilt angles of the RF source power applicator. By analyzing non-uniformities and modeling them as a function, Anisul's work facilitates the alignment of two plasma reactors, highlighting his expertise in optimization techniques in manufacturing processes.

Career Highlights

Throughout his career, Anisul has worked with significant companies, including Applied Materials, Inc., contributing his knowledge to advance manufacturing technologies. His innovations have not only propelled his career but have also driven advancements in the semiconductor manufacturing industry.

Collaborations

Anisul has collaborated with esteemed colleagues like Ajay Kumar and Dragan Valentin Podlesnik. These collaborations reflect his ability to work within diverse teams, leveraging collective expertise to elevate the scope and application of his inventions.

Conclusion

Anisul Haque Khan's contributions to innovations in materials science and plasma technology exemplify the spirit of invention. With a robust portfolio of patents and impactful collaborations, he continues to influence and shape the future of manufacturing technologies. His work not only showcases individual talent but also highlights the collaborative nature of technological advancement in today’s fast-paced world.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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