The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 27, 2005
Filed:
Apr. 08, 2002
Applicants:
Anisul Khan, Santa Clara, CA (US);
Sharma V Pamarthy, Hayward, CA (US);
Sanjay Thekdi, Santa Clara, CA (US);
Ajay Kumar, Sunnyvale, CA (US);
Inventors:
Anisul Khan, Santa Clara, CA (US);
Sharma V Pamarthy, Hayward, CA (US);
Sanjay Thekdi, Santa Clara, CA (US);
Ajay Kumar, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/302 ; H01L021/3065 ;
U.S. Cl.
CPC ...
Abstract
Openings of variable shape are made sequentially by alternately etching an opening in silicon and depositing a conformal fluorocarbon polymer on the sidewalls. This polymer protects the sidewalls of the opening from further etching. An isotropic etch can be carried out to change the profile of the etched feature, and for lift-off of the etched feature from the silicon substrate.