The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Oct. 28, 2013
Applied Materials, Inc., Santa Clara, CA (US);
Gaurav Saraf, Santa Clara, CA (US);
Xiawan Yang, San Jose, CA (US);
Farid Abooameri, Pleasanton, CA (US);
Wen Teh Chang, Sunnyvale, CA (US);
Anisul H. Khan, Santa Clara, CA (US);
Bradley Scott Hersch, Park City, UT (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Etch rate distributions are captured at a succession of hardware tilt angles of the RF source power applicator relative to the workpiece and their non-uniformities computed, and the behavior is modeled as a non-uniformity function for each one of at least two plasma reactors. An offset Δα in tilt angle α between the non-uniformity functions of the two plasma reactors is detected. The two plasma reactors are then matched by performing a hardware tilt in one of them through a tilt angle equal to the offset Δα.