Xiawan Yang

**Title: Innovator Xiawan Yang: Advancing Semiconductor Technologies**

Introduction

Xiawan Yang, a prominent inventor based in San Jose, CA, has made significant contributions to the field of semiconductor processing. With a total of five patents to his name, Yang's work represents innovative approaches that enhance the capabilities and efficiency of semiconductor technologies.

Latest Patents

Among his latest inventions, Yang has developed methods for integration processes utilizing boron-doped silicon materials. These exemplary processing methods involve depositing boron-containing material or silicon-and-boron-containing material on a substrate within a semiconductor processing chamber. Additionally, he invented methods that include etching portions of these materials with a chlorine-containing precursor to create features on the substrate, followed by removing the remaining materials with a fluorine-containing precursor.

Another notable patent from Yang is focused on boron nitride for mask patterning. This involves delivering a boron-containing precursor and a nitrogen-containing precursor to a processing region in a semiconductor chamber. The process also includes providing a hydrogen-containing precursor, with a flow rate ratio greater than or about 2:1 compared to the other precursors. Ultimately, these methods lead to the deposition of a boron-and-nitrogen material on the substrate within the processing region.

Career Highlights

Xiawan Yang's invention portfolio reflects his expertise and innovation in the semiconductor field. His position as an inventor at Applied Materials, Inc. places him at the forefront of developing advanced manufacturing technologies that support the semiconductor industry. His contributions not only drive technological advancements but also pave the way for future innovations.

Collaborations

Throughout his career, Yang has collaborated with notable individuals in the field, including coworkers Anisul Haque Khan and Gaurav Saraf. These collaborations have enriched his work and fostered an environment of shared knowledge and innovation.

Conclusion

Xiawan Yang stands out as a leading figure in semiconductor technology innovation. His contributions through his patents have a profound impact on the efficiency and effectiveness of semiconductor processing techniques. As he continues to advance his work at Applied Materials, Inc., the industry eagerly anticipates the further developments that Yang will bring to light.