Wen Teh Chang

Title: Innovations of Wen Teh Chang

Introduction

Wen Teh Chang is a notable inventor based in Sunnyvale, CA, with a remarkable portfolio of nine patents. His work primarily focuses on advancements in plasma reactor technology, which has significant implications in various industrial applications.

Latest Patents

Chang's latest patents include a method of matching two or more plasma reactors. This innovative approach captures etch rate distributions at various hardware tilt angles of the RF source power applicator relative to the workpiece. The non-uniformities are computed, and the behavior is modeled as a non-uniformity function for each plasma reactor. An offset in tilt angle between the non-uniformity functions of the reactors is detected, allowing for precise matching by adjusting the tilt in one of the reactors. Another significant patent is a predictive method of matching two plasma reactors, which similarly predicts etch rate distribution non-uniformities and models the behavior for effective reactor matching.

Career Highlights

Throughout his career, Wen Teh Chang has contributed to leading companies in the technology sector, including Solyndra and Applied Materials. His expertise in plasma technology has positioned him as a key player in the field, driving innovation and efficiency in manufacturing processes.

Collaborations

Chang has collaborated with talented professionals such as Tarpan Dixit and Alex Shenderovich, enhancing the collaborative spirit in his work environment.

Conclusion

Wen Teh Chang's contributions to plasma reactor technology through his patents and collaborations highlight his significant impact on the industry. His innovative methods continue to shape advancements in manufacturing processes.