The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
Mar. 30, 2006
Joseph Michael Ranish, San Jose, CA (US);
Tarpan Dixit, San Francisco, CA (US);
Dean Jennings, Beverly, MA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Aaron Hunter, Santa Cruz, CA (US);
Wolfgang Aderhold, Cupertino, CA (US);
Bruce Adams, Portland, CA (US);
Wen Teh Chang, Sunnyvale, CA (US);
Joseph Michael Ranish, San Jose, CA (US);
Tarpan Dixit, San Francisco, CA (US);
Dean Jennings, Beverly, MA (US);
Balasubramanian Ramachandran, Santa Clara, CA (US);
Aaron Hunter, Santa Cruz, CA (US);
Wolfgang Aderhold, Cupertino, CA (US);
Bruce Adams, Portland, CA (US);
Wen Teh Chang, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.