Bradley Scott Hersch

Title: Innovations by Inventor Bradley Scott Hersch

Introduction

Bradley Scott Hersch is a notable inventor based in Park City, UT, who has made significant strides in the field of plasma reactor technology. With a total of two patents to his name, Hersch's contributions have emphasized the importance of etch rate distributions and non-uniformities in advancing plasma reactor performance.

Latest Patents

Hersch's innovative work is highlighted by his latest patents, which focus on methods for matching plasma reactors. His first patent, titled "Method of matching two or more plasma reactors," involves a detailed analysis of etch rate distributions captured at various tilt angles of the RF source power applicator relative to the workpiece. The method emphasizes the computation of non-uniformities and models them as a non-uniformity function. By detecting an offset in tilt angle between the non-uniformity functions of the reactors, one reactor is adjusted to match the other, thereby enhancing operational efficiency.

The second patent, "Predictive method of matching two plasma reactors," builds on this concept by predicting etch rate distribution non-uniformities for a variety of tilt angles. This predictive approach also utilizes a non-uniformity function for each of the reactors and offers a strategy for adjusting hardware tilt based on the detected offset, promoting synchronization of the reactors.

Career Highlights

Hersch is currently employed at Applied Materials, Inc., a leading company in the semiconductor manufacturing equipment sector. His role involves not only the development of innovative technologies but also fostering advancements that enhance overall manufacturing processes within the industry.

Collaborations

In his professional journey, Hersch has collaborated closely with colleagues, including Gaurav Saraf and Xiawan Yang. These partnerships have contributed to the successful development and refining of his patented methodologies, further cementing his influence in the research and development landscape of plasma technology.

Conclusion

Bradley Scott Hersch's contributions to the field of plasma reactors through his patents signify his commitment to innovation. His methods for matching plasma reactors demonstrate a sophisticated understanding of non-uniformities and operational efficiencies essential for ongoing advancements in semiconductor manufacturing. As he continues to develop and refine these technologies, Hersch remains a pivotal figure in the evolving technological horizon of the industry.