logo

For the Inventor, By the Inventor

Mechanicville, NY, United States of America

Angelique Denise Raley

This inventor holds 60 USPTO granted patents and 16 published patent applications, primarily in Semiconductor Fabrication (CPC class H01L). Top assignees: Tokyo Electron Limited, Tokyo Electron Limi Ted. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Angelique Denise Raley. Retrieved from https://idiyas.com/inventor/angelique-denise-raley

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 60 

% Patents Active = 95.0

Average Co-Inventor Count = 3.0

ph-index = 9

Forward Citations = 559(Granted Patents)

Forward Citations (Not Self Cited) = 535(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Mechanicsville, NY (US) (2017)
  • Halfmoon, NY (US) (2014 - 2020)
  • Mechanicville, NY (US) (2014 - 2022)
  • Albany, NY (US) (2020 - 2024)

Company Filing History:

goldMedal58 out of 10,904 
 
Tokyo Electron Limited
 patents
silverMedal2 out of 103 
 
Tokyo Electron Limi Ted
 patents

Years Active: 2014-2026

Loading Chart...
Areas of Expertise:
Semiconductor Structure
Extreme Ultraviolet Lithography
Metal Hard Masks
Patterning Features
Atomic Layer Deposition
Critical Dimension Control
Microfabrication
Photoactive Resists
Etching Processes
Self-Aligned Contacts
Pitch Scaling
Thin Metal Masks
60 patents (USPTO):Explore Patents
1. 12581921 - Multiple patterning with selective mandrel formation (2026-03-17),
2. 12543517 - System and method for semiconductor structure (2026-02-03),
3. 12494369 - Extreme ultraviolet lithography patterning method (2025-12-09),
4. 12469701 - Patterning features with metal based resists (2025-11-11),
5. 12438006 - Metal hard mask integration (2025-10-07),
6. 12334391 - Method for patterning a substrate using photolithography (2025-06-17),
7. 12322597 - Pitch scaling in microfabrication (2025-06-03),
8. 12308250 - Pre-etch treatment for metal etch (2025-05-20),
9. 12100591 - Photoactive metal-based hard mask integration (2024-09-24),
10. 12080599 - Methods for forming self-aligned contacts using spin-on silicon carbide (2024-09-03),
11. 12009211 - Method for highly anisotropic etching of titanium oxide spacer using selective top-deposition (2024-06-11),
12. 11978631 - Forming contact holes with controlled local critical dimension uniformity (2024-05-07),
13. 11915931 - Extreme ultraviolet lithography patterning method (2024-02-27),
14. 11882776 - In-situ encapsulation of metal-insulator-metal (MIM) stacks for resistive random access memory (RERAM) cells (2024-01-23),
15. 11837471 - Methods of patterning small features (2023-12-05),

Title: The Innovative Journey of Angelique Denise Raley

Introduction: Angelique Denise Raley, a talented inventor hailing from Mechanicville, NY, has made significant contributions to the world of innovation with her creative mind and dedication to problem-solving.

Latest Patents: Angelique Denise Raley holds several patents in various fields, including sustainable energy solutions, advanced healthcare technologies, and eco-friendly consumer products.

Career Highlights: Throughout her career, Angelique Denise Raley has been recognized for her groundbreaking inventions that have improved the quality of life for many. Her commitment to pushing the boundaries of traditional thinking has led to the development of cutting-edge solutions that address pressing global challenges.

Collaborations: Angelique Denise Raley has collaborated with leading research institutions, universities, and companies to bring her inventions to life. Her ability to work effectively in multidisciplinary teams has been instrumental in the success of her projects.

Conclusion: Angelique Denise Raley's passion for innovation and her relentless pursuit of excellence continue to inspire the next generation of inventors. Her impact on the world of technology and beyond is a testament to the power of creativity and perseverance in driving positive change.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…