Location History:
- Kanagawa-ken, JP (1998)
- Tokyo, JP (2012)
- Isehara, JP (2002 - 2014)
- Hiratsuka, JP (2011 - 2014)
Company Filing History:
15 out of 560 
7 out of 2,730 
2 out of 985 
Years Active: 1998-2014
Title: Akira Sumitani: Pioneering Innovations in Extreme Ultraviolet Light Source Technology
Introduction: Akira Sumitani, an inventive mind based in Isehara, Japan, has made significant contributions to the field of extreme ultraviolet (EUV) light source technology. With an impressive portfolio of 22 patents, Sumitani is recognized for his commitment to advancing innovations that enhance the efficiency and safety of EUV source apparatuses.
Latest Patents: Sumitani’s recent patents include groundbreaking inventions such as the "Collector Mirror Exchanging Apparatus and Method for Extreme Ultraviolet Light Source Apparatus." This apparatus enables the safe and efficient exchange of collector mirrors that are crucial for collecting extreme ultraviolet light generated from plasma within the EUV light source chamber. The design features a supporting base and a guiding rail to facilitate the movement and replacement of the collector mirror with ease.
Another noteworthy patent is the "Extreme Ultraviolet Light Source Device and Method for Generating Extreme Ultraviolet Light." This innovative device focuses on reducing debris generation during plasma creation. By ionizing target materials with a specialized ionizer and simultaneously irradiating the materials with laser beams of various wavelengths, the technique enhances the ionization process. Resultantly, the ionized target material is extracted from the ionizer and integrated into the plasma generation chamber to produce EUV radiation when the driver laser beam is applied.
Career Highlights: Throughout his career, Sumitani has contributed to various esteemed organizations, including Gigaphoton Inc. and Komatsu Corporation. His work at these institutions has solidified his reputation as a leading inventor in the burgeoning field of EUV technology.
Collaborations: Sumitani has collaborated with notable professionals in the industry, including Tamotsu Abe and Osamu Wakabayashi. These partnerships highlight his ability to work effectively with other innovators and advance state-of-the-art technologies in extreme ultraviolet light sources.
Conclusion: Akira Sumitani stands as a prominent figure in the realm of EUV light source technology, with a suite of patents that reflect his dedication to innovation. His latest inventions not only further the technical capabilities of EUV apparatuses but also underscore the importance of collaboration among inventors and engineers. As the demand for advanced photolithography techniques continues to grow, Sumitani’s contributions will play an essential role in shaping the future of the semiconductor industry.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.