The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 2013
Filed:
Mar. 14, 2011
Georg Soumagne, Hiratsuka, JP;
Yoshifumi Ueno, Hiratsuka, JP;
Hiroshi Komori, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Katsunobu Nishihara, Suita, JP;
Young Gwang Kang, Suita, JP;
Masanori Nunami, Suita, JP;
Georg Soumagne, Hiratsuka, JP;
Yoshifumi Ueno, Hiratsuka, JP;
Hiroshi Komori, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Katsunobu Nishihara, Suita, JP;
Young Gwang Kang, Suita, JP;
Masanori Nunami, Suita, JP;
Gigaphoton Inc., Tokyo, JP;
Osaka University, Osaka, JP;
Abstract
In an extreme ultra violet light source apparatus of a laser produced plasma type, charged particles such as ions emitted from plasma are promptly ejected to the outside of a chamber. The apparatus includes a chamber, a target supply unit for supplying a target material into the chamber, a collector mirror for collecting extreme ultra violet light radiated from plasma generated by irradiating the target material with a laser beam to output the extreme ultra violet light, an electromagnet arranged outside of the chamber, and a charged particle collection mechanism provided on at least one of two surfaces of the chamber to which lines of magnetic force generated by the electromagnet extend.