Young Gwang Kang

Title: Young Gwang Kang: Innovator in Extreme Ultra Violet Light Source Technology

Introduction

Young Gwang Kang is a notable inventor based in Suita, Japan. He has made significant contributions to the field of extreme ultra violet (EUV) light source technology. With a total of 2 patents, his work has advanced the capabilities of laser produced plasma systems.

Latest Patents

Kang's latest patents focus on the development of an extreme ultra violet light source apparatus. This apparatus is designed to efficiently eject charged particles, such as ions, emitted from plasma to the outside of a chamber. The first patent describes a system that includes a chamber, a target supply unit for introducing a target material, and a collector mirror for capturing the extreme ultra violet light generated by the plasma. The second patent further enhances this technology by incorporating a magnetic field forming unit that creates an asymmetric magnetic field at the plasma generation site, improving the overall efficiency of the light source.

Career Highlights

Throughout his career, Young Gwang Kang has worked with prestigious institutions such as Osaka University and Gigahoton Inc. His experience in these organizations has allowed him to refine his expertise in the field of plasma technology and light sources.

Collaborations

Kang has collaborated with notable colleagues, including Georg Soumagne and Yoshifumi Ueno. These partnerships have contributed to the innovative advancements in his research and development efforts.

Conclusion

Young Gwang Kang's contributions to extreme ultra violet light source technology demonstrate his commitment to innovation and excellence in the field. His patents and collaborations reflect a dedication to advancing scientific understanding and practical applications in this important area of research.