The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Sep. 15, 2009
Akira Endo, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Kouji Kakizaki, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Takanobu Ishihara, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Hakaru Mizoguchi, Hiratsuka, JP;
Akira Endo, Hiratsuka, JP;
Hideo Hoshino, Hiratsuka, JP;
Kouji Kakizaki, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Takanobu Ishihara, Hiratsuka, JP;
Shinji Nagai, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Hakaru Mizoguchi, Hiratsuka, JP;
Gigaphoton Inc., Tochigi, JP;
Abstract
An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.