The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2012
Filed:
Mar. 18, 2009
Yoshifumi Ueno, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Tamotsu Abe, Odawara, JP;
Akira Sumitani, Isehara, JP;
Hideo Hoshino, Hiratsuka, JP;
Akira Endo, Tokyo, JP;
Georg Soumagne, Kamakura, JP;
Yoshifumi Ueno, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Tamotsu Abe, Odawara, JP;
Akira Sumitani, Isehara, JP;
Hideo Hoshino, Hiratsuka, JP;
Akira Endo, Tokyo, JP;
Georg Soumagne, Kamakura, JP;
Gigaphoton, Inc., Oyama-shi, JP;
Abstract
An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.