The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2013
Filed:
Jun. 11, 2009
Masato Moriya, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Takashi Suganuma, Hiratsuka, JP;
Akira Endo, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Masato Moriya, Hiratsuka, JP;
Osamu Wakabayashi, Hiratsuka, JP;
Tamotsu Abe, Hiratsuka, JP;
Takashi Suganuma, Hiratsuka, JP;
Akira Endo, Hiratsuka, JP;
Akira Sumitani, Hiratsuka, JP;
Gigaphoton Inc., Oyama-Shi, JP;
Abstract
An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.