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Sumitomo Eaton Nova Corporation

USPTO Granted Patents = 21

% Expired Patents = 19.0

Trademarks = 2

Forward Citations = 210

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23 inventors (with patents filed for the assignee):

Mitsukuni Tsukihara (7 out of 26 patents)

Mitsuaki Kabasawa (7 out of 30 patents)

Michiro Sugitani (7 out of 14 patents)

4. Tadamoto Tamai (5 out of 9 patents)

5. Junichi Murakami (4 out of 8 patents)

6. Keiji Okada (3 out of 14 patents)

7. Hiroshi Matsushita (3 out of 13 patents)

8. Masateru Sato (3 out of 5 patents)

9. Hiroki Murooka (2 out of 4 patents)

10. Makoto Sano (2 out of 7 patents)

11. Yoshitaka Amano (2 out of 8 patents)

12. Hirohiko Murata (2 out of 3 patents)

13. Yoshitomo Hidaka (2 out of 3 patents)

14. Masamitsu Shinozuka (2 out of 4 patents)

15. Hiroshi Kawaguchi (2 out of 2 patents)

21 patents: Sort by Forward Citations

1. 7217934 - Wafer scanning device (2007-05-15),

2. 7187143 - Mover device and semiconductor manufacturing apparatus and method (2007-03-06),

3. 7138641 - Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system (2006-11-21),

4. 7012263 - Ion source apparatus and electronic energy optimized method therefor (2006-03-14),

5. 6984833 - Ion implanter and method for controlling the same (2006-01-10),

6. 6815697 - Ion beam charge neutralizer and method therefor (2004-11-09),

7. 6803590 - Ion beam mass separation filter, mass separation method thereof and ion source using the same (2004-10-12),

8. 6797968 - Ion beam processing method and apparatus therefor (2004-09-28),

9. 6794661 - Ion implantation apparatus capable of increasing beam current (2004-09-21),

10. 6753539 - Ion implantation apparatus equipped with plasma shower and ion implantation method (2004-06-22),

11. 6720563 - Ion implantation apparatus and ion implantation method (2004-04-13),

12. 6663791 - Detection method of coating film thickness and ion implantation equipment using this method (2003-12-16),

13. 6635889 - Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof (2003-10-21),

14. 6573517 - Ion implantation apparatus (2003-06-03),

15. 6547504 - Wafer carrying system and carrying method thereof (2003-04-15),

Company Overview

Sumitomo Eaton Nova Corporation, headquartered in Tokyo, specializes in advanced semiconductor technology and manufacturing. The company focuses on developing high-performance products for various applications, including telecommunications, automotive, and industrial sectors. With a commitment to innovation, Sumitomo Eaton Nova plays a significant role in enhancing the efficiency and reliability of electronic systems. Its research initiatives aim to push the boundaries of semiconductor capabilities, contributing to the evolution of modern technology.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 13 2026

21 Patents

#1,310 in Tokyo

#2,862 in Japan

#29,961 in the World

Sumitomo Eaton Nova Corporation

Forward Citations = 210

23 inventors:

Mitsukuni Tsukihara (7 out of 26 patents)

Mitsuaki Kabasawa (7 out of 30 patents)

Michiro Sugitani (7 out of 14 patents)

4. Tadamoto Tamai (5 out of 9 patents)

5. Junichi Murakami (4 out of 8 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Sumitomo Eaton Nova Corporation. Retrieved from https://idiyas.com/company/sumitomo-eaton-nova

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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