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Sumitomo Eaton Nova Corporation

USPTO Granted Patents = 21

Trademarks = 2

Forward Citations = 210

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23 inventors (with patents filed for the assignee):

Mitsukuni Tsukihara (7 out of 26 patents)

Mitsuaki Kabasawa (7 out of 30 patents)

Michiro Sugitani (7 out of 14 patents)

4. Tadamoto Tamai (5 out of 9 patents)

5. Junichi Murakami (4 out of 8 patents)

6. Keiji Okada (3 out of 14 patents)

7. Hiroshi Matsushita (3 out of 13 patents)

8. Masateru Sato (3 out of 5 patents)

9. Hiroki Murooka (2 out of 4 patents)

10. Makoto Sano (2 out of 7 patents)

11. Yoshitaka Amano (2 out of 8 patents)

12. Hirohiko Murata (2 out of 3 patents)

13. Yoshitomo Hidaka (2 out of 3 patents)

14. Masamitsu Shinozuka (2 out of 4 patents)

15. Hiroshi Kawaguchi (2 out of 2 patents)

21 patents: Sort by Forward Citations

1. 7217934 - Wafer scanning device (2007-05-15),

2. 7187143 - Mover device and semiconductor manufacturing apparatus and method (2007-03-06),

3. 7138641 - Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system (2006-11-21),

4. 7012263 - Ion source apparatus and electronic energy optimized method therefor (2006-03-14),

5. 6984833 - Ion implanter and method for controlling the same (2006-01-10),

6. 6815697 - Ion beam charge neutralizer and method therefor (2004-11-09),

7. 6803590 - Ion beam mass separation filter, mass separation method thereof and ion source using the same (2004-10-12),

8. 6797968 - Ion beam processing method and apparatus therefor (2004-09-28),

9. 6794661 - Ion implantation apparatus capable of increasing beam current (2004-09-21),

10. 6753539 - Ion implantation apparatus equipped with plasma shower and ion implantation method (2004-06-22),

11. 6720563 - Ion implantation apparatus and ion implantation method (2004-04-13),

12. 6663791 - Detection method of coating film thickness and ion implantation equipment using this method (2003-12-16),

13. 6635889 - Ion implantation apparatus suited for low energy ion implantation and tuning method for ion source system thereof (2003-10-21),

14. 6573517 - Ion implantation apparatus (2003-06-03),

15. 6547504 - Wafer carrying system and carrying method thereof (2003-04-15),

Sumitomo Eaton Nova Corporation specializes in providing advanced engineering solutions for various industries. Their expertise lies in the development and production of high-quality hydraulic components, systems, and solutions. With a strong focus on innovation and customer satisfaction, they deliver reliable and efficient products that meet the evolving needs of their clients. Visit their website to learn more about their products, services, and commitment to excellence.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

21 Patents

#1,140 in Tokyo

#2,803 in Japan

#29,079 in the World

Sumitomo Eaton Nova Corporation

Forward Citations = 210

23 inventors:

Mitsukuni Tsukihara (7 out of 26 patents)

Mitsuaki Kabasawa (7 out of 30 patents)

Michiro Sugitani (7 out of 14 patents)

4. Tadamoto Tamai (5 out of 9 patents)

5. Junichi Murakami (4 out of 8 patents)

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