The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Apr. 09, 2002
Applicant:
Inventors:
Mitsukuni Tsukihara, Ehime, JP;
Mitsuaki Kabasawa, Ehime, JP;
Michiro Sugitani, Ehime, JP;
Hiroki Murooka, Ehime, JP;
Hiroshi Matsushita, Ehime, JP;
Assignee:
Sumitomo Eaton Nova Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 3/7317 ; H01J 2/700 ;
U.S. Cl.
CPC ...
H01J 3/7317 ; H01J 2/700 ;
Abstract
In an ion implantation apparatus according to the present invention, ions are extracted from an ion source with the aid of extraction electrodes. The ions thus extracted are analyzed in mass by means of a mass analysis magnet apparatus and a mass analysis slit, so that the required ions are implanted in a substrate. Magnets for generating cusp magnetic fields are serially disposed along an ion beam line extending from the front part to the rear part of the mass analysis magnet apparatus.