Ehime, Japan

Hiroki Murooka

USPTO Granted Patents = 4 

Average Co-Inventor Count = 2.4

ph-index = 3

Forward Citations = 42(Granted Patents)


Location History:

  • Saijo, JP (2004)
  • Ehime, JP (2004 - 2021)

Company Filing History:


Years Active: 2004-2021

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4 patents (USPTO):Explore Patents

Title: Innovating the Future: The Contributions of Hiroki Murooka

Introduction

Hiroki Murooka, an accomplished inventor based in Ehime, Japan, has made significant contributions to the field of ion generation and plasma technology. With a total of four patents to his name, Murooka continues to push the boundaries of innovation, developing solutions that cater to modern technological needs.

Latest Patents

Among Murooka’s most notable patents are the ion generator and ion implanter, which feature a vapor generating chamber that heats a raw material to produce vapor. This innovative design allows for the generation of plasma containing ions of an impurity element, facilitating advanced industrial applications. Furthermore, he has developed an impurity-doped layer formation apparatus and an electrostatic chuck protection method. This method provides a protective surface for an electrostatic chuck to prevent the adherence of volatile foreign materials in a vacuum environment, enhancing overall efficiency in substrate processing.

Career Highlights

Murooka's career has been marked by notable positions at distinguished companies such as Sumitomo Eaton Nova Corporation and Sumitomo Heavy Industries, Ltd. His work at these organizations has allowed him to refine his expertise and contribute to pioneering projects within the industry.

Collaborations

Throughout his career, Murooka has collaborated with a talented team, including notable colleagues like Mitsukuni Tsukihara and Mitsuaki Kabasawa. These partnerships have fostered an environment of shared innovation, leading to the creation and enhancement of various technologies.

Conclusion

In summary, Hiroki Murooka exemplifies the spirit of innovation through his work and patents. His dedication to advancing ion generation technology and collaboration with fellow experts positions him as a key figure in the field, paving the way for future advancements.

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