For the Inventor, By the Inventor

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Shanghai, China

Semiconductor Manufacturing (shanghai) International Corporation

USPTO Granted Patents = 54

Forward Citations = 23

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83 inventors (with patents filed for the assignee):

Nan Wang (6 out of 69 patents)

Jin Jisong (4 out of 6 patents)

Fei Zhou (3 out of 153 patents)

4. Haiyang Zhang (3 out of 83 patents)

5. Zhuofan Chen (3 out of 7 patents)

6. Poren Tang (2 out of 14 patents)

7. Zhaomeng (2 out of 2 patents)

8. Tzu Yin Chiu (2 out of 7 patents)

9. Chong Wang (2 out of 8 patents)

10. Haifang Zhang (2 out of 8 patents)

11. Xuanjie Liu (2 out of 11 patents)

12. Jun Yang (2 out of 126 patents)

13. Zhenghao Gan (1 out of 17 patents)

14. Yang Ming (1 out of 4 patents)

15. Bei Duohui (1 out of 4 patents)

Core Competencies:

Semiconductor Structure

LDMOS Device

Fin-Based Semiconductor Structure

Gate-All-Around Field Effect Transistor

Photolithography Plate

Integrated Circuit

Fingerprint Recognition Apparatus

Image Sensor

Microphone Manufacturing

Interconnection Structure

Semiconductor Random Access Memory

High-K Metal Gate Fin Field-Effect Transistor

54 patents: Sort by Forward Citations

1. 11211478 - Semiconductor structure and method for forming same (2021-12-28),

2. 11211260 - Semiconductor structure and method for forming same (2021-12-28),

3. 11145756 - Semiconductor structure and method of forming a semiconductor structure (2021-10-12),

4. 11121313 - Semiconductor structure and formation method thereof (2021-09-14),

5. 11121252 - LDMOS device and manufacturing method thereof (2021-09-14),

6. 11114548 - Semiconductor device having source and drain in active region and manufacturing method for same (2021-09-07),

7. 11075287 - Semiconductor structure and forming method thereof (2021-07-27),

8. 11075284 - Semiconductor structure and forming method thereof (2021-07-27),

9. 11075270 - Semiconductor structure and method for forming the same (2021-07-27),

10. 11075135 - Semiconductor structure and method of forming a semiconductor structure (2021-07-27),

11. 11069792 - Semiconductor device and manufacturing method therefor (2021-07-20),

12. 11069694 - Semiconductor structure and method for forming same (2021-07-20),

13. 11063119 - Semiconductor structure and method for forming the same (2021-07-13),

14. 11062952 - Method of forming a semiconductor structure by sacrificial layers and spacer (2021-07-13),

15. 11011627 - Semiconductor structure and method for the forming same (2021-05-18),

Semiconductor Manufacturing (Shanghai) International Corporation, a leading semiconductor manufacturing company, specializes in the production of advanced integrated circuits and semiconductor products. With state-of-the-art facilities and cutting-edge technology, SSMIC delivers high-quality solutions to meet the demands of the global semiconductor market. The company is committed to innovation, excellence, and customer satisfaction.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

54 Patents

#55 in Shanghai

#540 in China

#12,736 in the World

Shanghai, China

Semiconductor Manufacturing (shanghai) International Corporation

Forward Citations = 23

83 inventors:

Nan Wang (6 out of 69 patents)

Jin Jisong (4 out of 6 patents)

Fei Zhou (3 out of 153 patents)

4. Haiyang Zhang (3 out of 83 patents)

5. Zhuofan Chen (3 out of 7 patents)

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