Shanghai, China

Bei Duohui


Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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4 patents (USPTO):

Title: Innovator Bei Duohui: Pioneering Advances in Semiconductor Technology

Introduction: Bei Duohui is an accomplished inventor based in Shanghai, China, known for his significant contributions to the field of semiconductor technology. With a total of four patents to his name, his work focuses on enhancing the efficiency and accuracy of semiconductor structures, addressing critical issues within the industry.

Latest Patents: Among Bei Duohui’s latest innovations is a method for forming a semiconductor structure. This innovative approach includes providing a base, forming a pattern memory layer on the base, and creating the trenches using different masks. By doing so, it effectively mitigates issues such as photoresist peeling during the etching process. His other noteworthy patent entails a comprehensive methodology for forming semiconductor structures, which encompasses several ion implantation steps and trench formations to improve pattern transfer accuracy. These advancements highlight Bei's commitment to solving complex technical challenges in semiconductor manufacturing.

Career Highlights: Bei Duohui has made a remarkable impact while working with reputed companies in the semiconductor industry, such as Semiconductor Manufacturing International (Beijing) Corporation and Semiconductor Manufacturing International (Shanghai) Corporation. His extensive experience in these roles has allowed him to refine his skills and contribute significantly to the field.

Collaborations: Throughout his career, Bei has collaborated with talented coworkers, including Yang Ming and Zhu Chen. Their collective expertise and teamwork have facilitated advancements in semiconductor technologies and enhanced the development of innovative solutions within the industry.

Conclusion: With a strong foundation in semiconductor technology and a portfolio of valuable patents, Bei Duohui stands out as an influential inventor. His continuous innovation and problem-solving capabilities contribute significantly to the growth and advancement of the semiconductor sector. As technology progresses, the impact of his work will undoubtedly foster further advancements and inspire upcoming inventors in the field.

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