Shanghai, China

Yang Ming

USPTO Granted Patents = 4 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2021-2025

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4 patents (USPTO):

Title: Innovator Yang Ming: Transforming Semiconductor Manufacturing in Shanghai

Introduction

Yang Ming is a distinguished inventor based in Shanghai, China, renowned for his significant contributions to the semiconductor industry. With a total of 4 patents to his name, Yang's innovative approaches have propelled advancements in semiconductor structure formation, addressing key challenges in the manufacturing process.

Latest Patents

Yang Ming's most recent patents showcase his expertise in developing methods for forming semiconductor structures. One notable patent details a method that begins with providing a base and forming a pattern memory layer on it. The procedure involves creating at least two trenches using different masks, with their extending directions being parallel. This innovation effectively addresses issues related to photoresist peeling during etching and reduces the reliance on filling materials.

Another of his latest patents focuses on improving accuracy in pattern transfer within semiconductor structures. This method includes steps like ion implantation to form doped mask layers, creating trenches, and etching the base to achieve a target pattern. Through these processes, Yang has enhanced the precision of semiconductor manufacturing, reinforcing the industry's productivity and efficiency.

Career Highlights

Throughout his career, Yang Ming has been affiliated with leading firms in the semiconductor sector, including Semiconductor Manufacturing International (Beijing) Corporation and Semiconductor Manufacturing International (Shanghai) Corporation. His work has consistently demonstrated a commitment to innovation and excellence, particularly in the intricate processes involved in semiconductor production.

Collaborations

Yang has collaborated with various professionals in the industry, including colleagues Bei Duohui and Zhu Chen. These partnerships have played a pivotal role in refining his methodologies and advancing the collective knowledge in semiconductor technology.

Conclusion

In summary, Yang Ming's inventive spirit and dedication to enhancing semiconductor manufacturing processes have solidified his reputation as a key figure in the industry. His latest patents reflect a deep understanding of the technical challenges faced by manufacturers, and his collaborative efforts continue to inspire new innovations in the field. With each new patent, Yang reinforces the importance of ingenuity and precision in technology development.

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