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Wilmington, MA, United States of America

Onto Innovation Inc.

USPTO Granted Patents = 62

EPO Patents = 2

Trademarks = 49

Forward Citations = 34

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87 inventors (with patents filed for the assignee):

George Andrew Antonelli (8 out of 41 patents)

Manjusha Mehendale (6 out of 10 patents)

Nigel P Smith (5 out of 8 patents)

4. Nicholas James Keller (5 out of 5 patents)

5. Robin Mair (5 out of 11 patents)

6. J Casey Donaher (4 out of 8 patents)

7. Jian Ding (4 out of 4 patents)

8. John F Lesoine (3 out of 5 patents)

9. Christopher J McLaughlin (3 out of 5 patents)

10. Pedro Vagos (3 out of 10 patents)

11. Wayne Fitzgerald (3 out of 5 patents)

12. Paul A Doyle (3 out of 4 patents)

13. Jian Lu (3 out of 3 patents)

14. Xin Song (3 out of 3 patents)

15. Troy Daniel Ribaudo (3 out of 5 patents)

Core Competencies:

Substrate Edge Patterning

Surface Inspection

Overlay Correction

Non-Destructive Inspection

Defect Detection

Optical Metrology

Deep Learning

Wafer Inspection

Calibration

Interferometry

High-Resolution Imaging

Metrology Systems

62 patents: Sort by Forward Citations

1. 12743025 - Substrate edge patterning techniques (2026-09-22),

2. 12710490 - SYSTEM AND METHOD FOR PERFORMING CHARACTERIZATION OF A SAMPLE (2026-08-18),

3. 12693241 - Surface inspection system (2026-07-28),

4. 12663730 - Front-to-back overlay (FTBO) standard (2026-06-23),

5. 12657689 - Substrate defect-detection and comparison (2026-06-16),

6. 12656245 - Non-destructive inspection and manufacturing metrology systems and methods (2026-06-16),

7. 12619219 - Fabrication fingerprint for proactive yield management (2026-05-05),

8. 12585205 - Low numerical aperture alignment (2026-03-24),

9. 12585182 - Overlay correction for advanced integrated-circuit devices (2026-03-24),

10. 12581914 - Optical metrology with nuisance feature mitigation (2026-03-17),

11. 12579633 - Periodic-pattern background removal (2026-03-17),

12. 12560550 - Photo response non-uniformity correction during semiconductor inspection (2026-02-24),

13. 12546705 - Focusing system with filter for open or closed loop control (2026-02-10),

14. 12519382 - Two-axis-motion from a linear actuator (2026-01-06),

15. 12474643 - System and method for performing alignment and overlay measurement through an opaque layer (2025-11-18),

Company Overview

Onto Innovation Inc. is a leading provider of advanced optical metrology solutions, specializing in technologies that enhance semiconductor manufacturing processes. The company focuses on critical areas such as substrate edge patterning, surface inspection, and overlay correction, employing innovative techniques in non-destructive inspection and defect detection. By integrating deep learning into wafer inspection, Onto Innovation aims to improve yield and efficiency in the production of cutting-edge electronic devices, positioning itself as a key player in the high-tech landscape of Wilmington, MA.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 6 2026

62 Patents

#8 in Wilmington, MA

#328 in Massachusetts

#5,842 in US

#11,761 in the World

Wilmington, MA, United States of America

Onto Innovation Inc.

Forward Citations = 34

87 inventors:

George Andrew Antonelli (8 out of 41 patents)

Manjusha Mehendale (6 out of 10 patents)

Nigel P Smith (5 out of 8 patents)

4. Nicholas James Keller (5 out of 5 patents)

5. Robin Mair (5 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Onto Innovation Inc.. Retrieved from https://idiyas.com/company/onto-innovation

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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