The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2026

Filed:

Jul. 11, 2023
Applicant:

Onto Innovation Inc., Wilmington, MA (US);

Inventors:

Roman S. Basistyy, Sunny Isles Beach, FL (US);

Jin Ju, Edina, MN (US);

Jian Ding, Methuen, MA (US);

Jatinder Dhaliwal, Plano, TX (US);

Assignee:

Onto Innovation Inc., Wilmington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 5/10 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G06T 5/10 (2013.01); G06T 2207/20132 (2013.01);
Abstract

Various examples described herein include various mechanisms, techniques, and methods to subtract collected signals caused by a periodic pattern formed on substrates to enable a higher level of defect detection on substrates. Signals detected by various types of metrology and substrate-inspection systems that are caused by periodic patterns on inspected substrates can be reduced or eliminated by, for example, a Fourier analysis of the detected signals. Both gray-scale value thresholds and area thresholds may be applied after the Fourier analysis of the image and are sufficient for defect detection on an image with a substantially-reduced number of false defects or no defects being present in a final image produced after processing. Other techniques and methods are also disclosed.


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