Edina, MN, United States of America

Jin Ju

This inventor holds 1 USPTO granted patent. Top assignee: Onto Innovation Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin Ju. Retrieved from https://idiyas.com/inventor/jin-ju

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jin Ju in Substrate Inspection Technology

Introduction

Jin Ju is an accomplished inventor based in Edina, MN (US). He has made significant contributions to the field of substrate inspection technology. His innovative work focuses on enhancing defect detection methods through advanced signal processing techniques.

Latest Patents

Jin Ju holds a patent for a groundbreaking invention titled "Periodic-pattern background removal." This patent describes various mechanisms, techniques, and methods to subtract collected signals caused by periodic patterns formed on substrates. The invention enables a higher level of defect detection on substrates. By employing Fourier analysis of detected signals, the invention effectively reduces or eliminates signals caused by periodic patterns. This results in a final image with a substantially reduced number of false defects or no defects at all. The patent outlines additional techniques and methods that further enhance defect detection capabilities.

Career Highlights

Jin Ju is currently associated with Onto Innovation Inc., where he applies his expertise in substrate inspection technology. His work has been instrumental in advancing the company's capabilities in defect detection and image processing.

Collaborations

Throughout his career, Jin Ju has collaborated with notable colleagues, including Roman S Basistyy and Jian Ding. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Jin Ju's contributions to substrate inspection technology through his patent on periodic-pattern background removal exemplify his commitment to innovation. His work continues to influence the industry and improve defect detection methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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