The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2026
Filed:
Dec. 05, 2022
Applicant:
Onto Innovation Inc., Wilmington, MA (US);
Inventor:
J. Casey Donaher, Westford, MA (US);
Assignee:
Onto Innovation Inc., Wilmington, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01); G06T 7/13 (2017.01); G06T 7/33 (2017.01); G06T 7/73 (2017.01); H04N 5/33 (2023.01); H04N 23/90 (2023.01); H04N 25/76 (2023.01);
U.S. Cl.
CPC ...
G03F 9/7088 (2013.01); G06T 7/13 (2017.01); G06T 7/337 (2017.01); G06T 7/74 (2017.01); H04N 5/33 (2013.01); H04N 23/90 (2023.01); H04N 25/76 (2023.01); G06T 2207/10048 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30204 (2013.01);
Abstract
Disclosed herein are examples of a photolithography machine with fast alignment. The machine may include a stage to hold and move a substrate and a projection system to project images on a plurality of exposure regions of the substrate. The machine may also include an alignment system positioned adjacent to the projection system. The alignment system may include a plurality of microscope cameras with a fixed focus, each microscope camera configured to detect a respective fiducial in a respective exposure region of the substrate.