The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2026
Filed:
Apr. 20, 2022
Applicant:
Onto Innovation Inc., Wilmington, MA (US);
Inventor:
Prasad Bachiraju, Nashua, NH (US);
Assignee:
ONTO INNOVATION INC., Wilmington, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 2219/32368 (2013.01); G05B 2219/45031 (2013.01);
Abstract
Systems and methods for improving wafer fabrication. Wafers may be inspected at various points in the fabrication process to generate inspection data. The inspection data and wafer-in-progress data may be used to identify defect patterns and tools and/or processes that cause wafer defects. The inspection data may be stacked to form virtual wafer maps that amplify signals to detect patterns more easily. Defect patterns and tools and/or processes may also be identified through machine learning models receiving artificial defect visualizations as input.