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Jx Advanced Metals Corporation

USPTO Granted Patents = 28

CIPO Patents = 5

EPO Patents = 10

Trademarks = 11

Forward Citations = 0

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55 inventors (with patents filed for the assignee):

Shuhei Murata (3 out of 8 patents)

Koichi Takemoto (3 out of 8 patents)

Katsushi Aoki (3 out of 12 patents)

4. Toru Imori (3 out of 4 patents)

5. Ryo Suzuki (2 out of 134 patents)

6. Makoto Mikami (2 out of 6 patents)

7. Yoshiki Yamazaki (2 out of 5 patents)

8. Yasuyuki Iwabuchi (2 out of 6 patents)

9. Hiroshi Takamura (1 out of 15 patents)

10. Ryosuke Sakashita (1 out of 6 patents)

11. Mitsuo Yamashita (1 out of 41 patents)

12. Yoshitaka Shibuya (1 out of 18 patents)

13. Hiroki Kajita (1 out of 2 patents)

14. Satoyasu Narita (1 out of 7 patents)

15. Kenji Sato (1 out of 67 patents)

28 patents: Sort by Forward Citations

1. 12448704 - MgSi single crystal, MgSi single crystal substrate, infrared light receiving element and method for producing MgSi single crystal (2025-10-21),

2. 12438185 - Sulfide-based solid electrolyte and all-solid lithium ion battery (2025-10-07),

3. 12404580 - Tungsten silicide target member and method for manufacturing same, and method for manufacturing tungsten silicide film (2025-09-02),

4. 12312674 - Sputtering target (2025-05-27),

5. 12312655 - Method for processing electronic and electrical device component scrap (2025-05-27),

6. 12303916 - Peptide and method for using same (2025-05-20),

7. 12297121 - Stannous oxide powder and method for producing same (2025-05-13),

8. 12258164 - Method for preparing package of sputtering target, and method for transporting same (2025-03-25),

9. 12247276 - Copper powder, method for manufacturing copper powder, and method for manufacturing solid shaped object (2025-03-11),

10. 12241153 - Sputtering target and manufacturing method therefor (2025-03-04),

11. 12234544 - Sputtering target and method for producing sputtering target (2025-02-25),

12. 12224166 - Magnesium oxide sputtering target (2025-02-11),

13. 12217967 - Indium phosphide substrate (2025-02-04),

14. 12198911 - Nonmagnetic material-dispersed Fe-Pt based sputtering target (2025-01-14),

15. 12195351 - Molybdenum oxychloride or tungsten oxychloride and production method thereof (2025-01-14),

Jx Advanced Metals Corporation is a leading manufacturer and distributor of advanced metals for various industries such as aerospace, automotive, and defense. With a strong focus on research and development, the company offers high-quality products that meet the needs of its customers. Visit their website for more information on their products and services.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 23 2025

28 Patents

#972 in Tokyo

#2,359 in Japan

#22,553 in the World

Jx Advanced Metals Corporation

Forward Citations = 0

55 inventors:

Shuhei Murata (3 out of 8 patents)

Koichi Takemoto (3 out of 8 patents)

Katsushi Aoki (3 out of 12 patents)

4. Toru Imori (3 out of 4 patents)

5. Ryo Suzuki (2 out of 134 patents)

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